Radioelektronikos terminų žodynas. – Vilnius : BĮ UAB „Litimo“. Kazimieras Gaivenis, Gytis Juška, Vidas Kalesinskas. 2000.
Computer-generated holography — (CGH) is the method of digitally generating holographic interference patterns. A holographic image can be generated e.g. by digitally computing a holographic interference pattern and printing it onto a mask or film for subsequent illumination by… … Wikipedia
Computer generated holography — (CGH) is the method of digitally generating holographic interference patterns. A holographic image can be generated e.g. by digitally computing a holographic interference pattern and printing it onto a mask or film for subsequent illumination by… … Wikipedia
elektronenlithografisch hergestellte Maske — elektronpluošte technologija pagaminta kaukė statusas T sritis radioelektronika atitikmenys: angl. electron beam generated mask vok. elektronenlithografisch hergestellte Maske, f rus. шаблон, изготовленный по электронно лучевой технологии, m… … Radioelektronikos terminų žodynas
elektronpluošte technologija pagaminta kaukė — statusas T sritis radioelektronika atitikmenys: angl. electron beam generated mask vok. elektronenlithografisch hergestellte Maske, f rus. шаблон, изготовленный по электронно лучевой технологии, m pranc. masque fabriqué par technologie à faisceau … Radioelektronikos terminų žodynas
masque fabriqué par technologie à faisceau d'électrons — elektronpluošte technologija pagaminta kaukė statusas T sritis radioelektronika atitikmenys: angl. electron beam generated mask vok. elektronenlithografisch hergestellte Maske, f rus. шаблон, изготовленный по электронно лучевой технологии, m… … Radioelektronikos terminų žodynas
шаблон, изготовленный по электронно-лучевой технологии — elektronpluošte technologija pagaminta kaukė statusas T sritis radioelektronika atitikmenys: angl. electron beam generated mask vok. elektronenlithografisch hergestellte Maske, f rus. шаблон, изготовленный по электронно лучевой технологии, m… … Radioelektronikos terminų žodynas
Cathode ray tube — Cutaway rendering of a color CRT: 1. Three Electron guns (for red, green, and blue phosphor dots) 2. Electron beams 3. Focusing coils 4. Deflection coils 5. Anode connection 6. Mask for separating beams for red,… … Wikipedia
Multiple patterning — is a class of technologies developed for photolithography to enhance the feature density. The simplest case of multiple patterning is double patterning, where a conventional lithography process is enhanced to produce double the expected number of … Wikipedia
Extreme ultraviolet lithography — (also known as EUV or EUVL ) is a next generation lithography technology using the 13.5 nm EUV wavelength. EUVL opticsEUVL is a significant departure from the deep ultraviolet lithography used today. All matter absorbs EUV radiation. Hence, EUV… … Wikipedia
Superlens — A superlens, super lens or perfect lens is a lens which uses metamaterials to go beyond the diffraction limit. The diffraction limit is an inherent limitation in conventional optical devices or lenses.[1] In 2000, a type of lens was proposed,… … Wikipedia
